Light

For use in metallurgical and chemical industries as alloying additives, catalysts, production of reagents.

Particle structure

Grid size per ISO 565, μm Particle size, μm Particle size distribution, %
CPL-1 CPL-2 CPL-3
63 ≥63 5,0 max 5,0 max 10,0 max
<63 95,0 min 95,0 min 90,0 min
Bulk density, g/cm3 0,65-0,85 0,90-1,10 1,25-1,45
Copper mass fraction, %, min 99,5 99,6
Oxygen mass fraction, %, max 0,40 0,30 0,25

Note: “<” represents undersize material, “≥” represents oversize material in the particle size value

Fine

For use in the electronics industry (thick and thin filming, mixing with silver to make pastes), die casting, production of conductive fillers, diamond tools, catalysts, and vacuum switches.

Particle structure

Grid size per ISO 565, μm Particle size, μm Particle size distribution, %
CPF-1 CPF-2 CPF-3 CPF-4
45 <45 95,0 min
25 <25 90,0 min
Mass fraction of oxygen, %, max 0,45
Bulk density, g/cm3 1,60-2,00 1,25-1,60 1,10-1,60 1,60-2,00
Copper mass fraction, %, min 99,5
Oxygen mass fraction, %, max 0,20 0,30

Note: “<” represents undersize material, “≥” represents oversize material in the particle size value

Medium

For the production of sintered products in metallurgical, electrical, aeronautical, automotive, machine-building industries (brushes for electric machines, rings, bushings, bearings, electrical contacts, welding electrodes, brake pads, clutch linings, diamond tools, consumer goods for household and economic purposes).

Particle structure

Grid size per ISO 565, μm Particle size, μm Particle size distribution, %
CPS-1 CPS-12 CPS-14 CPS-A CPS-11
100 ≥100 0,5 max 0,5 max 0,1 max
71 <71 90,0 min 90,0 min
63 ≥63
<63 95,0 min
45 <45 65,0-80,0 73,0-80,0
Bulk density, g/cm3 1,25-2,00 1,20-1,60 1,50-2,00 1,30-1,50 1,25-1,90
Copper mass fraction, %, min 99,5
Oxygen mass fraction, %, max 0,20 0,30 0,20

Note: “<” represents undersize material, “≥” represents oversize material in the particle size value

Ultrafine

For the production of electronic circuits, thick film pastes, electrically and thermally conductive pastes, electrodes, pyrotechnics, printing (screen-printing), conductive inks for RFID tags and portable electronics, anticorrosive, electromagnetic shielding and decorative coatings.

Particle structure

Parameters Values
CPU-5 CPU-10
D50, мкм 5,0±0,75 10,0±1,0
D99, мкм <30 <100
Bulk density, g/cm3 0,6-1,6
Specific surface area, cm2/g, min 2500
Copper mass fraction, %, min 99,3
Oxygen mass fraction, %, max 0,45

Note: “<” represents undersize material, “≥” represents oversize material in the particle size value