Light

For use in metallurgical and chemical industries as alloying additives, catalysts, production of reagents.

Particle structure

Grid size

per ISO 565, µm

Particle size,

µm

Particle size distribution, %

CPL-1

CPL-2

CPL-3

63

≥63

5.0 max

5.0 max

10.0 max

<63

95.0 min

95.0 min

90.0 min

Apparent density, g/cm3

0.65-0.85

0.90-1.10

1.25-1.45

Copper mass fraction, %, min

99.5

99.6

Oxygen mass fraction, %, max

0.40

0.30

0.25


Note: in the particle size value, “<” represents undersize material, “≥” represents oversize material

Fine

For use in the electronics industry (thick and thin filming, mixing with silver to make pastes), die casting, production of conductive fillers, diamond tools, catalysts, and vacuum switches.

Particle structure

Grid size per ISO 565, µm

Particle size, µm

Particle size distribution, %

CPF-1

CPF-2

CPF-3

CPF-4

45

<45

95.0 min

25

<25

90.0 min

Apparent density, g/cm3

1.60-2.00

1.25-1.60

1.10-1.60

1.60-2.00

Copper mass fraction, %, min

99.5

Oxygen mass fraction, %, max

0.20

0.30


Note: “<” represents undersize material, “≥” represents oversize material in the particle size value

Medium

For the production of sintered products in metallurgical, electrical, aeronautical, automotive, machine-building industries (brushes for electric machines, rings, bushings, bearings, electrical contacts, welding electrodes, brake pads, clutch linings, diamond tools, consumer goods for household and economic purposes).

Particle structure

Grid size
per ISO 565, µm

Particle size,

µm

Particle size distribution, %

CPS-1

CPS-11

CPS-12

CPS-14

CPS-A

CPS-C

CPS-N

450

<450

90.0 min

224

<224

95.0 min

180

<180

10.0 max

100

≥100

0.1 max

<100

99.5 min

99.5 min

99.5 min

99.5 min

71

<71

90.0 min

90.0 min

90.0 min

90.0 min

63

<63

95.0 min

45

<45

65.0-80.0

65.0-80.0

65.0-80.0

73.0-80.0

Apparent density, g/cm3

1.25-2.00

1.25-1.90

1.20-1.60

1.50-2.00

1.30-1.50

2.50-3.50

Copper mass fraction, %, min

99.5

Oxygen mass fraction, %, max

0.20

0.30

0.50


Note: “<” represents undersize material, “≥” represents oversize material in the particle size value

Ultrafine

For the production of electronic circuits, thick film pastes, electrically and thermally conductive pastes, electrodes, pyrotechnics, printing (screen-printing), conductive inks for RFID tags and portable electronics, anticorrosive, electromagnetic shielding and decorative coatings.

Particle structure

Characteristics

Values

CPU-5

CPU-10

D50, µm

4.25-5.75

9.0-11.0

D99, µm

<30

<100

Apparent density, g/cm3

0.6-1.6

Specific surface area, cm2/g, min

2500

Copper mass fraction, %, min

99.3

Oxygen mass fraction, %, max

0.45


Note: “<” represents undersize material, “≥” represents oversize material in the particle size value